Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chih-Cheng Chiu0
Ching-Yu Chang0
Date of Patent
May 6, 2014
0Patent Application Number
139716500
Date Filed
August 20, 2013
0Patent Citations Received
Patent Primary Examiner
Patent abstract
Lithography methods on a semiconductor substrate are described. The methods include coating a resist layer on the substrate, wherein the resist layer comprises a resist polymer configured to turn soluble to a base solution in response to reaction with an acid, and a switchable polymer that includes a base soluble polymer having a carboxylic acid, hydroxyl, lactone, or anhydride functional group, performing a pre-exposure bake on the resist layer, exposing the resist-coated substrate, and developing the exposed substrate with a developing solution.
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