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US Patent 8741394 In-situ deposition of film stacks
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Patent
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Date Filed
December 16, 2010
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Date of Patent
June 3, 2014
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Patent Application Number
12970846
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Patent Citations Received
US Patent 11746420 PECVD apparatus for in-situ deposition of film stacks
US Patent 12125711 Reducing roughness of extreme ultraviolet lithography resists
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US Patent 12080592 Film stack simplification for high aspect ratio patterning and vertical scaling
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Patent Inventor Names
George Andrew Antonelli
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Bart van Schravendijk
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Dong Niu
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Mandyam Sriram
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Patrick Breiling
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Pramod Subramonium
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Jason Haverkamp
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Jennifer O'Loughlin
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Joe Womack
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John Alexy
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•••
Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
8741394
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Patent Primary Examiner
Bret Chen
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