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US Patent 8745550 Fracture aware OPC
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Patent
Date Filed
July 9, 2012
Date of Patent
June 3, 2014
Patent Application Number
13544014
Patent Citations Received
US Patent 12009202 Using a self-assembly layer to facilitate selective formation of an etching stop layer
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US Patent 11748540 Method and structure for mandrel and spacer patterning
US Patent 11947254 Method of mask data synthesis and mask making
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Patent Inventor Names
Yu-Po Tang
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Chien-Fu Lee
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Nian-Fuh Cheng
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Ru-Gun Liu
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Sheng-Wen Lin
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Wen-Chun Huang
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Yong-Cheng Lin
0
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
8745550
Patent Primary Examiner
Naum Levin
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