US Patent 8747610 Plasma source pumping and gas injection baffle
Patent 8747610 was granted and assigned to Tokyo Electron on June, 2014 by the United States Patent and Trademark Office.
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Patent Inventor Names
Lee Chen0
Merritt Funk0
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US Patent 08747610 Plasma source pumping and gas injection baffle US Patent 8747610 Plasma source pumping and gas injection baffle
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Patent Number
087476100
Patent Number
87476100
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Is a
Current Assignee
Patent Jurisdiction
Patent Number
087476100
Date of Patent
June 10, 2014
0Patent Application Number
134367600
Date Filed
March 30, 2012
0Official Website
Patent Primary Examiner
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US Patent 08747610 Plasma source pumping and gas injection baffle
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
08747610
Date of patent
June 10, 2014
Patent application number
13436760
Date Filed
March 30, 2012
Patent primary examiner
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