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US Patent 8751976 Pattern recognition for integrated circuit design

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Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

Date of Patent

June 10, 2014

Patent Application Number

13534300

Date Filed

June 27, 2012

Patent Citations Received

US Patent 12009202 Using a self-assembly layer to facilitate selective formation of an etching stop layer

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US Patent 11664237 Semiconductor device having improved overlay shift tolerance

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US Patent 11748540 Method and structure for mandrel and spacer patterning

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