US Patent 8754508 Structure to increase resistance to electromigration

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Is a

Patent

Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

87545080

Patent Inventor Names

Hsien-Wei Chen0

Hung-Jui Kuo0

Date of Patent

June 17, 2014

Patent Application Number

135981960

Date Filed

August 29, 2012

Patent Citations Received

‌

US Patent 11908835 Semiconductor structure and manufacturing method thereof

‌

US Patent 11862588 Semiconductor device and method

‌

US Patent 11862599 Bonding to alignment marks with dummy alignment marks

Patent Primary Examiner

‌

Chris Chu

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