US Patent 8794250 Substrate processing method and substrate processing apparatus

Patent 8794250 was granted and assigned to Tokyo Electron on August, 2014 by the United States Patent and Trademark Office.

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Patent

Patent attributes

Patent Applicant

Tokyo Electron

Current Assignee

Tokyo Electron

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

8794250

Patent Inventor Names

Kenji Sekiguchi0

Takehiko Orii0

Satoru Tanaka0

Hiroki Ohno0

Noritaka Uchida0

Date of Patent

August 5, 2014

Patent Application Number

13693712

Date Filed

December 4, 2012

Patent Citations Received

‌

US Patent 11710629 Substrate processing apparatus and substrate processing method

Patent Primary Examiner

‌

Sylvia R. MacArthur

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