US Patent 8796483 Cyclic metal amides and vapor deposition using them
Patent 8796483 was granted and assigned to President and Fellows of Harvard College on August, 2014 by the United States Patent and Trademark Office.
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Patent Inventor Names
Adam S. Hock0
Jaeyeong Heo0
Prasert Sinsermsuksakul0
Roy G. Gordon0
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Patent Citations Received
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US Patent 08796483 Cyclic metal amides and vapor deposition using them US Patent 8796483 Cyclic metal amides and vapor deposition using them
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Patent Number
087964830
Patent Number
87964830
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Official Website
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
087964830
Date of Patent
August 5, 2014
0Patent Application Number
130772410
Date Filed
March 31, 2011
0Official Website
Patent Primary Examiner
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Website URL
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US Patent 08796483 Cyclic metal amides and vapor deposition using them
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
08796483
Date of patent
August 5, 2014
Patent application number
13077241
Date Filed
March 31, 2011
Patent primary examiner
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