US Patent 8846536 Flowable oxide film with tunable wet etch rate

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Is a

Patent

Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

88465360

Patent Inventor Names

Karena Shannon0

Bart van Schravendijk0

Kaihan Ashtiani0

Nerissa Draeger0

Date of Patent

September 30, 2014

Patent Application Number

134939360

Date Filed

June 11, 2012

Patent Citations Received

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US Patent 12094709 Plasma treatment process to densify oxide layers

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US Patent 11699584 Si-containing film forming precursors and methods of using the same

‌

US Patent 11756786 Forming high carbon content flowable dielectric film with low processing damage

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US Patent 12060639 Rapid flush purging during atomic layer deposition

Patent Primary Examiner

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Lan Vinh

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