Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Juwen Gao0
Pragna Nannapaneni0
Novy Tjokro0
Sanjay Gopinath0
Tianhua Yu0
Ruopeng Deng0
Xiaolan Ba0
Sema Ermez0
Date of Patent
August 13, 2024
0Patent Application Number
175943660
Date Filed
April 15, 2020
0Patent Citations
...
Patent Primary Examiner
Patent abstract
Provided herein are methods and related apparatus for purging processing chambers during an atomic layer deposition (ALD) process. The methods involve flowing purging gas from one or more accumulators to remove process gases from the processing chambers. Following the flowing of purging gas, additional reactants may be introduced into the processing chamber to continue an ALD cycle.
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