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US Patent 8871651 Mask formation processing

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US Patent 12009228 Low temperature chuck for plasma processing systems
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US Patent 11915950 Multi-zone semiconductor substrate supports
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Patent Inventor Names
Dae Han Choi0
Fangyu Wu0
Zhuangfei Chen0
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=08871651
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US Patent 11682560 Systems and methods for hafnium-containing film removal
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US Patent 08871651 Mask formation processing US Patent 8871651 Mask formation processing

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Patent Number
08871651
Patent Number
8871651
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Website URL
https://pdfpiw.uspto.gov/.piw?Docid=08871651
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 US Patent 08871651 Mask formation processing

Infobox
Is a
Patent
Patent
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
08871651
Date of patent
October 28, 2014
Patent application number
13940535
Date Filed
July 12, 2013
Patent primary examiner
‌
Lan Vinh

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