US Patent 8889024 Plasma etching method
Patent 8889024 was granted and assigned to Hitachi on November, 2014 by the United States Patent and Trademark Office.
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Patent Inventor Names
Mamoru Yakushiji0
Michikazu Morimoto0
Tetsuo Ono0
Tomoyuki Watanabe0
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US Patent 08889024 Plasma etching method US Patent 8889024 Plasma etching method
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Patent Number
08889024
Patent Number
8889024
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US Patent 08889024 Plasma etching method
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Is a
Patent applicant
Current assignee
Patent jurisdiction
Patent number
08889024
Date of patent
November 18, 2014
Patent application number
14248844
Date Filed
April 9, 2014
Patent primary examiner
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