US Patent 8954899 Contour alignment system

The present disclosure describes a method of calibrating a contour. The method includes designing an anchor pattern, printing the anchor pattern on a substrate, collecting scanning electron microscope (SEM) data of the printed anchor pattern on the substrate, wherein the SEM data includes a SEM image of the printed anchor pattern on the substrate, converting the SEM image of the printed anchor pattern on the substrate into a SEM contour of the printed anchor pattern, analyzing the SEM contour of the printed anchor pattern, and aligning the SEM contour of the anchor pattern to form the calibrated SEM contour.