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US Patent 8954899 Contour alignment system
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Patent
Date Filed
October 4, 2012
Date of Patent
February 10, 2015
Patent Application Number
13645256
Patent Citations Received
US Patent 12112116 Machine learning based model builder and its applications for pattern transferring in semiconductor manufacturing
0
US Patent 11914288 Photomask having recessed region
0
US Patent 12073166 Method and structure for mandrel patterning
0
US Patent 11747786 Synchronized parallel tile computation for large area lithography simulation
US Patent 11748551 Optical mode optimization for wafer inspection
US Patent 11763057 Critical dimension uniformity
US Patent 11789370 Optical proximity correction and photomasks
US Patent 11841619 Method for mask data synthesis with wafer target adjustment
0
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
8954899
Patent Primary Examiner
Vuthe Siek
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