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US Patent 8956980 Selective etch of silicon nitride

Patent 8956980 was granted and assigned to Applied Materials on February, 2015 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
Current Assignee
Applied Materials
Applied Materials
Date Filed
November 25, 2013
Date of Patent
February 17, 2015
Patent Applicant
Applied Materials
Applied Materials
Patent Application Number
14089182
Patent Citations Received
‌
US Patent 11682560 Systems and methods for hafnium-containing film removal
0
‌
US Patent 11915950 Multi-zone semiconductor substrate supports
0
‌
US Patent 12027410 Edge ring arrangement with moveable edge rings
0
Patent Inventor Names
Anchuan Wang
0
Nitin K. Ingle
0
Shankar Venkataraman
0
Zhijun Chen
0
Zihui Li
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
8956980
Patent Primary Examiner
‌
Roberts Culbert

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