Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Holger Maltor0
Udo Dinger0
Martin Weiser0
Claudia Ekstein0
Heiko Siekmann0
Johannes Lippert0
Date of Patent
March 10, 2015
Patent Application Number
13781073
Date Filed
February 28, 2013
Patent Citations Received
Patent Primary Examiner
Patent abstract
Substrates suitable for mirrors which are used at wavelengths in the EUV wavelength range have a main body (2) and a polishing layer (3). The polishing layer (3) has a thickness of less than 10 μm and a root-mean-square roughness of less than 0.5 nm and the main body (2) is produced from an aluminum alloy. Moreover, a highly reflective layer (6) is provided on the polishing layer (3) of the substrate (1) of the EUV mirror (5).
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