US Patent 8976927 Substrate for mirrors for EUV lithography
Patent 8976927 was granted and assigned to Carl Zeiss SMT on March, 2015 by the United States Patent and Trademark Office.
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Patent abstract
Substrates suitable for mirrors which are used at wavelengths in the EUV wavelength range have a main body (2) and a polishing layer (3). The polishing layer (3) has a thickness of less than 10 μm and a root-mean-square roughness of less than 0.5 nm and the main body (2) is produced from an aluminum alloy. Moreover, a highly reflective layer (6) is provided on the polishing layer (3) of the substrate (1) of the EUV mirror (5).
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Patent Inventor Names
Claudia Ekstein0
Heiko Siekmann0
Holger Maltor0
Johannes Lippert0
Martin Weiser0
Udo Dinger0
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US Patent 08976927 Substrate for mirrors for EUV lithography US Patent 8976927 Substrate for mirrors for EUV lithography
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Patent Number
08976927
Patent Number
8976927
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US Patent 08976927 Substrate for mirrors for EUV lithography
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Is a
Patent applicant
Current assignee
Patent jurisdiction
Patent number
08976927
Date of patent
March 10, 2015
Patent application number
13781073
Date Filed
February 28, 2013
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