Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
March 17, 2015
Patent Application Number
13486084
Date Filed
June 1, 2012
Patent Citations Received
Patent Primary Examiner
Patent abstract
A substrate cleaning method that includes: a step in which, while a substrate holder is being continuously rotated, a to-be-discharged position of the cleaning liquid on the substrate is changed to an eccentric position deviated from the central part of the substrate, and a gas is discharged from a gas nozzle to the central part of the substrate so as to form a dried area of the cleaning liquid under a condition in which a shortest distance between an edge of a cleaning liquid flow output from the cleaning-liquid nozzle and an edge of a gas flow output from the gas nozzle is set between 9 mm and 15 mm.
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