A pattern inspection apparatus is provided, including a reading mechanism configured to read a print pattern including an overlapped pattern portion formed by overlapping a first-pattern and a second-pattern and a single pattern portion formed with only any one of the first-pattern and the second-pattern; and a controller configured to perform acquisition of density information of the print pattern based on a result of the reading and correction of density information of the overlapped pattern portion by using density information of the single pattern portion.