Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Jeffrey A. Barnes0
Melissa A. Petruska0
Peng Zhang0
Xiaodong Yan0
Brian Benac0
Jun Liu0
Karl E. Boggs0
Lin Feng0
Date of Patent
July 7, 2015
Patent Application Number
13124942
Date Filed
October 20, 2009
Patent Citations Received
Patent Primary Examiner
Patent abstract
A cleaning composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The cleaning compositions include novel corrosion inhibitors. The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material or the copper interconnect material.
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