Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
August 4, 2015
0Patent Application Number
142730800
Date Filed
May 8, 2014
0Patent Citations Received
...
Patent Primary Examiner
Patent abstract
Integrated circuit methods are described. The methods include providing a photomask that includes two main features for two via openings and further includes an optical proximity correction (OPC) feature linking the two main features; forming a hard mask layer on a substrate, the hard mask layer including two trench openings; forming a patterned resist layer over the hard mask layer using the photomask, wherein the patterned resist layer includes a peanut-shaped opening with two end portion aligned with the two trench openings of the hard mask layer, respectively; and performing a first etch process to the substrate using the hard mask layer and the patterned resist layer as a combined etch mask.
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