Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
October 6, 2015
Patent Application Number
14013163
Date Filed
August 29, 2013
Patent Citations Received
Patent Primary Examiner
Patent abstract
A polymer capable of increasing alkali solubility under the action of acid, as a base resin is blended with a polymer comprising recurring units derived from a styrene having 1,1,1,3,3,3-hexafluoro-2-propanol as a polymeric additive to formulate a resist composition. The photoresist film formed using the resist composition is effective for minimizing outgassing therefrom during the EUV lithography, reducing LWR after development, and suppressing formation of blob defects after development because of its hydrophilic surface.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
