Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
October 20, 2015
Patent Application Number
13710809
Date Filed
December 11, 2012
Patent Citations Received
Patent Primary Examiner
Patent abstract
A resist composition containing a base component (A) that exhibits changed solubility in a developing solution under action of acid, a photoreactive quencher (C), and an acid generator component (B) that generates acid upon exposure, and further containing an acid (G) having a pKa of 4 or less.
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