Patent attributes
A transistor includes a silicon carbide crystal (110) having a silicon terminated face (112). A semiconducting-type graphene layer (120) is bonded to the silicon terminated face (112). A first semimetallic-type graphene layer (122) is contiguous with a first portion of the semiconducting-type graphene layer (120). A second semimetallic-type graphene layer (122) is contiguous with a second portion of the semiconducting-type graphene layer (120) that is spaced apart from the first portion. An insulator layer (132) is disposed on a portion of the semiconducting-type graphene layer (120). A gate conductive layer (134) disposed on the insulator layer (132) and spaced apart from the semiconducting-type graphene layer (120).