Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
December 29, 2015
0Patent Application Number
127093460
Date Filed
February 19, 2010
0Patent Citations Received
Patent Primary Examiner
Patent abstract
Provided are sulfonamide-containing photoresist compositions for use in lithographic processes that have improved properties for high resolution, low blur imaging. Also provided are alcohol-soluble photoresists for resist-on-resist applications. The sulfonamide-containing photoresist compositions of the present invention include positive-tone photoresist compositions that have sulfonamide-substituted repeat units with branched linking group as shown in Formula (I):
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