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US Patent 9223209 Sulfonamide-containing photoresist compositions and methods of use

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Patent abstract

Provided are sulfonamide-containing photoresist compositions for use in lithographic processes that have improved properties for high resolution, low blur imaging. Also provided are alcohol-soluble photoresists for resist-on-resist applications. The sulfonamide-containing photoresist compositions of the present invention include positive-tone photoresist compositions that have sulfonamide-substituted repeat units with branched linking group as shown in Formula (I):

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Patent Citations Received
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US Patent 11768435 Bottom-up conformal coating and photopatterning on PAG-immobilized surfaces
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=092232090
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US Patent 09223209 Sulfonamide-containing photoresist compositions and methods of use US Patent 9223209 Sulfonamide-containing photoresist compositions and methods of use

Infobox
Patent Number
092232090
Patent Number
92232090
Edits on 25 Sep, 2022
"Entity importer update"
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Golden AI
edited on 25 Sep, 2022
Infobox
Is a
Patent
Patent
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
092232090
Date of Patent
December 29, 2015
0
Patent Application Number
127093460
Date Filed
February 19, 2010
0
Official Website
https://pdfpiw.uspto.gov/.piw?Docid=092232090
Patent Primary Examiner
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Anca Eoff
0
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Website URL
https://pdfpiw.uspto.gov/.piw?Docid=09223209
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 US Patent 09223209 Sulfonamide-containing photoresist compositions and methods of use

Infobox
Is a
Patent
Patent
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
09223209
Date of patent
December 29, 2015
Patent application number
12709346
Date Filed
February 19, 2010
Patent primary examiner
‌
Anca Eoff

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