Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
December 29, 2015
0Patent Application Number
141895330
Date Filed
February 25, 2014
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A method includes coating a photo resist on a wafer in a first production tool, and performing a pre-exposure baking on the photo resist in a second production tool separate from the first production tool. After the pre-exposure baking, the photo resist is exposed using a lithography mask. After the step of exposing the photo resist, a post-exposure baking is performed on the photo resist. The photo resist is then developed.
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