Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
July 4, 2023
0Patent Application Number
170190940
Date Filed
September 11, 2020
0Patent Citations
...
Patent Citations Received
Patent Primary Examiner
A method of forming a pattern in a photoresist includes forming a photoresist layer over a substrate, and selectively exposing the photoresist layer to actinic radiation to form a latent pattern. The latent pattern is developed by applying a developer composition to the selectively exposed photoresist layer to form a pattern. The developer composition includes a first solvent having Hansen solubility parameters of 15<δ
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