Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
December 15, 2015
Patent Application Number
13486697
Date Filed
June 1, 2012
Patent Citations Received
Patent Primary Examiner
Patent abstract
Photosensitive materials and method of forming a pattern that include providing a composition of a component of a photosensitive material that is operable to float to a top region of a layer formed from the photosensitive material. In an example, a photosensitive layer includes a first component having a fluorine atom (e.g., alkyl fluoride group). After forming the photosensitive layer, the first component floats to a top surface of the photosensitive layer. Thereafter, the photosensitive layer is patterned.
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