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US Patent 9213234 Photosensitive material and method of lithography

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
June 1, 2012
Date of Patent
December 15, 2015
Patent Application Number
13486697
Patent Citations Received
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US Patent 12134690 Photoresist composition and method of manufacturing a semiconductor device
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US Patent 12087580 Method of manufacturing semiconductor devices
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US Patent 12085855 Resin, photoresist composition, and method of manufacturing semiconductor device
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US Patent 12135502 Resin, photoresist composition, and method of manufacturing semiconductor device
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US Patent 11664213 Bevel edge removal methods, tools, and systems
0
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US Patent 11662656 Mask and method of forming the same
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US Patent 11694896 Photoresist developer and method of developing photoresist
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US Patent 11705332 Photoresist layer surface treatment, cap layer, and method of forming photoresist pattern
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US Patent 11703765 Photoresist composition and method of manufacturing a semiconductor device
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US Patent 11714355 Photoresist composition and method of forming photoresist pattern
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•••
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
9213234
Patent Primary Examiner
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Cynthia H Kelly

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