Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
January 12, 2016
Patent Application Number
14044691
Date Filed
October 2, 2013
Patent Citations Received
Patent Primary Examiner
Patent abstract
A microlens substrate will warp when an oxide film is formed and annealed before forming a mask in order to adjust the etching rate of wet etching. Accordingly, a film exerting a stress that cancels out this warping is formed upon a microlens. This film functions as an optical path length adjusting layer.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
