US Patent 9234988 Fabrication method for microlens array substrate
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Patent abstract
A microlens substrate will warp when an oxide film is formed and annealed before forming a mask in order to adjust the etching rate of wet etching. Accordingly, a film exerting a stress that cancels out this warping is formed upon a microlens. This film functions as an optical path length adjusting layer.
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US Patent 09234988 Fabrication method for microlens array substrate US Patent 9234988 Fabrication method for microlens array substrate
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Patent Number
0923498800
Patent Number
923498800
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Patent Jurisdiction
Patent Number
092349880
Date of Patent
January 12, 2016
0Patent Application Number
140446910
Date Filed
October 2, 2013
0Official Website
Patent Primary Examiner
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Patent Jurisdiction
Patent Number
092349880
Date of Patent
January 12, 2016
0Patent Application Number
140446910
Date Filed
October 2, 2013
0Official Website
Patent Primary Examiner
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US Patent 09234988 Fabrication method for microlens array substrate
Infobox
Is a
Patent jurisdiction
Patent number
09234988
Date of patent
January 12, 2016
Patent application number
14044691
Date Filed
October 2, 2013
Patent primary examiner
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