Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Jun Hatakeyama0
Masaki Ohashi0
Masayoshi Sagehashi0
Date of Patent
February 2, 2016
Patent Application Number
14529582
Date Filed
October 31, 2014
Patent Citations Received
Patent Primary Examiner
Patent abstract
A photoresist film containing a sulfonium or iodonium salt of carboxylic acid having an amino group has a high dissolution contrast and offers improved resolution, wide focus margin and minimal LWR when used as a positive resist film adapted for alkaline development and a negative resist film adapted for organic solvent development.
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