US Patent 9250518 Resist composition and patterning process
All edits
Edits on 29 Mar, 2024
Golden AI
Edits made to:
Infobox (+1 properties)
Infobox
Patent Citations Received
Edits on 4 Jan, 2024
Golden AI
Edits made to:
Infobox (+1 properties)
Infobox
Patent Citations Received
Edits on 4 Dec, 2023
Golden AI
Edits made to:
Article (+349 characters)
Article
Patent abstract
A photoresist film containing a sulfonium or iodonium salt of carboxylic acid having an amino group has a high dissolution contrast and offers improved resolution, wide focus margin and minimal LWR when used as a positive resist film adapted for alkaline development and a negative resist film adapted for organic solvent development.
Edits on 29 Sep, 2023
Golden AI
Edits made to:
Infobox (+3 properties)
Infobox
Patent Inventor Names
Jun Hatakeyama0
Masaki Ohashi0
Masayoshi Sagehashi0
Edits on 20 May, 2023
Golden AI
Edits made to:
Infobox (+1/-1 properties)
US Patent 09250518 Resist composition and patterning process US Patent 9250518 Resist composition and patterning process
Infobox
Patent Number
09250518
Patent Number
9250518
Golden AI
Edits made to:
Infobox (-1 properties)
Infobox
Official Website
Edits on 17 Jun, 2022
Golden AI
Edits made to:
Infobox (+1 properties)
Infobox
Website URL
Edits on 5 Jan, 2022
Golden AI
Edits made to:
Infobox (+7 properties)
US Patent 09250518 Resist composition and patterning process
Infobox
Is a
Patent jurisdiction
Patent number
09250518
Date of patent
February 2, 2016
Patent application number
14529582
Date Filed
October 31, 2014
Patent primary examiner
Find more entities like US Patent 9250518 Resist composition and patterning process
Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.
