Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
February 9, 2016
Patent Application Number
13864624
Date Filed
April 17, 2013
Patent Citations Received
Patent Primary Examiner
Patent abstract
Provided is a phase-shift blankmask in which a phase-shift layer is formed in at least two continuous layers or a multi-layer film and an uppermost phase-shift layer included in the phase-shift layer is thinly formed to contain a small amount of oxygen (O) so as to enhance chemical resistance and durability thereof.
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