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US Patent 9281207 Solution processible hardmasks for high resolution lithography

Patent 9281207 was granted and assigned to Inpria on March, 2016 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Current Assignee
Inpria
Inpria
Date Filed
February 28, 2012
Date of Patent
March 8, 2016
Patent Application Number
13407541
Patent Citations Received
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US Patent 11947262 Process environment for inorganic resist patterning
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US Patent 11921427 Methods for making hard masks useful in next-generation lithography
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US Patent 11988965 Underlayer for photoresist adhesion and dose reduction
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US Patent 12105422 Photoresist development with halide chemistries
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Patent Inventor Names
Andrew Grenville
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Douglas A. Keszler
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Jason K. Stowers
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Michael Kocsis
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Stephen T. Meyers
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
9281207
Patent Primary Examiner
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Marc Armand

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