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US Patent 9304403 System and method for lithography alignment

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
January 2, 2013
Date of Patent
April 5, 2016
Patent Application Number
13732913
Patent Citations Received
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US Patent 12133319 Apparatus and method for generating extreme ultraviolet radiation
0
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US Patent 11756789 Semiconductor manufacturing method and apparatus thereof
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US Patent 11762302 Integrated circuit overlay test patterns and method thereof
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US Patent 11782352 Lithography process monitoring method
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US Patent 12087579 Method for forming semiconductor device
0
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US Patent 12085867 Lithography process monitoring method
0
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US Patent 12119273 System and method for high speed inspection of semiconductor substrates
0
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US Patent 11749571 System and method for high speed inspection of semiconductor substrates
Patent Inventor Names
Yu-Hsien Lin
0
Hung-Chang Hsieh
0
Chun-Yi Lee
0
Feng-Jia Shiu
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
9304403
Patent Primary Examiner
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Christina Riddle

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