US Patent 9310684 Organometallic solution based high resolution patterning compositions
Patent 9310684 was granted and assigned to Inpria on April, 2016 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
August 22, 2013
Date of Patent
April 12, 2016
Patent Applicant
Patent Application Number
13973098
Patent Citations Received
•••
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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