Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
December 20, 2016
Patent Application Number
15137819
Date Filed
April 25, 2016
Patent Citations Received
Patent Primary Examiner
Patent abstract
Methods of forming patterns includes guide patterns on a neutral layer. A self-assembling block copolymer (BCP) layer on the guide patterns and the neutral layer. By annealing the self-assembling BCP layer, first polymer block domains and second polymer block domains are formed The guide patterns are formed of a developable antireflective material. The neutral layer is formed of a cross-linked polymeric material.
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