US Patent 9523917 Methods of forming patterns
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Patent abstract
Methods of forming patterns includes guide patterns on a neutral layer. A self-assembling block copolymer (BCP) layer on the guide patterns and the neutral layer. By annealing the self-assembling BCP layer, first polymer block domains and second polymer block domains are formed The guide patterns are formed of a developable antireflective material. The neutral layer is formed of a cross-linked polymeric material.
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US Patent 09523917 Methods of forming patterns US Patent 9523917 Methods of forming patterns
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Patent Number
0952391700
Patent Number
952391700
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Patent Jurisdiction
Patent Number
095239170
Date of Patent
December 20, 2016
0Patent Application Number
151378190
Date Filed
April 25, 2016
0Official Website
Patent Primary Examiner
Edits on 24 Sep, 2022
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Infobox
Is a
Patent Jurisdiction
Patent Number
095239170
Date of Patent
December 20, 2016
0Patent Application Number
151378190
Date Filed
April 25, 2016
0Official Website
Patent Primary Examiner
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US Patent 09523917 Methods of forming patterns
Infobox
Is a
Patent jurisdiction
Patent number
09523917
Date of patent
December 20, 2016
Patent application number
15137819
Date Filed
April 25, 2016
Patent primary examiner
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