Patent 9530841 was granted and assigned to United Microelectronics Corporation on December, 2016 by the United States Patent and Trademark Office.
A gate-all-around (GAA) nanowire field-effect transistor (FET) device includes a semiconductor substrate, a nanowire on the semiconductor substrate, a gate structure surrounding a central portion of the nanowire, a source/drain region on either side of the gate structure, and at least one dislocation plane in the source/drain region.