US Patent 9645491 Sulfonium salt, chemically amplified resist composition, and patterning process
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Patent abstract
A sulfonium salt having both anion and cation moieties in the molecule functions as a photoacid generator and is compatible with other components. A resist composition comprising the sulfonium salt has the advantages of reduced acid diffusion and forms a pattern with a good balance of sensitivity, MEF and DOF, less outgassing, and minimal defects.
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US Patent 09645491 Sulfonium salt, chemically amplified resist composition, and patterning process US Patent 9645491 Sulfonium salt, chemically amplified resist composition, and patterning process
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Patent Number
0964549100
Patent Number
964549100
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Patent Jurisdiction
Patent Number
096454910
Date of Patent
May 9, 2017
0Patent Application Number
151635530
Date Filed
May 24, 2016
0Official Website
Patent Primary Examiner
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Patent Jurisdiction
Patent Number
096454910
Date of Patent
May 9, 2017
0Patent Application Number
151635530
Date Filed
May 24, 2016
0Official Website
Patent Primary Examiner
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US Patent 09645491 Sulfonium salt, chemically amplified resist composition, and patterning process
Infobox
Is a
Patent jurisdiction
Patent number
09645491
Date of patent
May 9, 2017
Patent application number
15163553
Date Filed
May 24, 2016
Patent primary examiner
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