US Patent 9679095 Layout decomposition for multiple patterning lithography
Patent 9679095 was granted and assigned to Mentor Graphics on June, 2017 by the United States Patent and Trademark Office.
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Aspects of the disclosed techniques relate to techniques of layout decomposition for multiple patterning lithography. Data of a coloring graph are derived from layout data for a layout design. The coloring graph is simplified by repeatedly applying a plurality of graph simplification units. Each of the graph simplification units is configured to use a unique approach to simplify a graph. Based on the simplified coloring graph, the layout design is decomposed to generate decomposition information. The decomposition process may comprise applying a heuristic method for coloring if needed. The decomposition information may comprise information of one or more layout regions that cannot be decomposed.
US Patent 09679095 Layout decomposition for multiple patterning lithography US Patent 9679095 Layout decomposition for multiple patterning lithography
US Patent 09679095 Layout decomposition for multiple patterning lithography
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