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US Patent 9679100 Environmental-surrounding-aware OPC

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
August 21, 2015
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Date of Patent
June 13, 2017
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Patent Application Number
14831926
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Patent Citations Received
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US Patent 12112116 Machine learning based model builder and its applications for pattern transferring in semiconductor manufacturing
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US Patent 11662657 Photo mask data correction method
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US Patent 11675962 Vertex-based OPC for opening patterning
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US Patent 11841619 Method for mask data synthesis with wafer target adjustment
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US Patent 11947254 Method of mask data synthesis and mask making
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Patent Inventor Names
Wen-Chun Huang
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Ming-Hui Chih
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Ru-Gun Liu
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Wen-Li Cheng
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
9679100
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Patent Primary Examiner
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Naum B Levin
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