Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Larry Martinez0
Anthony Ricci0
Saurabh Ullal0
Date of Patent
August 8, 2017
Patent Application Number
12844527
Date Filed
July 27, 2010
Patent Citations Received
0
Patent Primary Examiner
Patent abstract
Parasitic plasma in voids in a component of a plasma processing chamber can be eliminated by covering electrically conductive surfaces in an interior of the voids with a sleeve. The voids can be gas holes, lift pin holes, helium passages, conduits and/or plenums in chamber components such as an upper electrode and a substrate support.
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