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US Patent 9745660 Method for controlling a plasma chamber

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
May 4, 2015
Date of Patent
August 29, 2017
Patent Application Number
14702900
Patent Citations Received
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US Patent 11670488 Fast arc detecting match network
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US Patent 11769651 High-frequency power supply device and output method of high-frequency power
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US Patent 11791134 Impedance adjustment device
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US Patent 11887820 Sector shunts for plasma-based wafer processing systems
0
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US Patent 11923175 Systems and methods for variable gain tuning of matching networks
0
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US Patent 11961711 Radio frequency match network and generator
0
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US Patent 11972928 Method and system for plasma processing arc suppression
0
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US Patent 12027351 Plasma non-uniformity detection
0
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US Patent 12002611 High power low frequency coils
0
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US Patent 12132435 Method for repeatable stepper motor homing
0
•••
Patent Inventor Names
Imran Ahmed Bhutta
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
9745660
Patent Primary Examiner
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Bret Chen

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