Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Takashi Matsumoto0
Daisuke Nishide0
Munehito Kagaya0
Date of Patent
November 21, 2017
0Patent Application Number
149476590
Date Filed
November 20, 2015
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A graphene producing method which is capable of increasing a size of each domain of graphene. A plasma CVD film formation device that activates a catalyst metal layer formed on a wafer; modifies the same into an activated catalyst metal layer; decomposes a C2H4 gas as a low reactivity carbon-containing gas by plasma in a space that opposes the wafer; and decomposes a C2H2 gas as a high reactivity carbon-containing gas by heat in the space.
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