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US Patent 9841687 Synchronized integrated metrology for overlay-shift reduction
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Patent
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Date Filed
July 14, 2015
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Date of Patent
December 12, 2017
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Patent Application Number
14798563
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Patent Citations Received
US Patent 12133319 Apparatus and method for generating extreme ultraviolet radiation
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US Patent 11749571 System and method for high speed inspection of semiconductor substrates
US Patent 11762302 Integrated circuit overlay test patterns and method thereof
US Patent 12119273 System and method for high speed inspection of semiconductor substrates
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Patent Inventor Names
Jui-Chun Peng
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Yung-Cheng Chen
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Heng-Hsin Liu
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Yung-Yao Lee
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
9841687
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Patent Primary Examiner
Christopher Young
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