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US Patent 9857684 Silicon-containing photoresist for lithography

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
March 17, 2016
Date of Patent
January 2, 2018
Patent Application Number
15072635
Patent Citations Received
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US Patent 12134690 Photoresist composition and method of manufacturing a semiconductor device
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US Patent 12074025 Photoresist developer and method of developing photoresist
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US Patent 12087580 Method of manufacturing semiconductor devices
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US Patent 12085855 Resin, photoresist composition, and method of manufacturing semiconductor device
0
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US Patent 12135502 Resin, photoresist composition, and method of manufacturing semiconductor device
0
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US Patent 11705332 Photoresist layer surface treatment, cap layer, and method of forming photoresist pattern
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US Patent 11703765 Photoresist composition and method of manufacturing a semiconductor device
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US Patent 11714355 Photoresist composition and method of forming photoresist pattern
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US Patent 11784046 Method of manufacturing a semiconductor device
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US Patent 11934101 Photoresist composition and method of forming photoresist pattern
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•••
Patent Inventor Names
Ching-Yu Chang
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Li-Yen Lin
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
9857684
Patent Primary Examiner
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Cynthia Hamilton

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