Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Nobutaka Kikuiri0
Date of Patent
January 16, 2018
0Patent Application Number
154974250
Date Filed
April 26, 2017
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A pattern inspection apparatus includes a column to scan a substrate on which a pattern is formed, using multi-beams composed of a plurality of electron beams, a stage to mount the substrate thereon and to be movable, a detector to detect secondary electrons emitted from the substrate because the substrate is irradiated with the multi-beams, and a drive mechanism to move the detector in order to follow movement of the stage.
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